薄膜材料与纳米技术
Thin Film Materials & Nanotechnology
北京科技大学材料科学学院 唐伟忠
Tel,6233 2475
E-mail,wztang@mater.ustb.edu.cn
课件下载网址,wztang_teaching@sina.com
下 载 密 码,123456
课程实验
—— 薄膜材料专题文献阅读一、实验目的每位同学以自己选择的英文文献为线索
，通过阅读文献和其他的相关材料，达到较深入地了解薄膜材料制备技术领域某一具体课题的目的。
二、实验内容与方案根据指导教师给定的英文文献，结合授课内容进行独立阅读，并查阅相关的背景资料，并完成 3000字左右的文献阅读报告。同时，通过对于文献的公开宣讲，使其他同学也对相关课题有所了解。
三、实验基本要求每位同学阅读自己选择的文献，并按照文献的实验思路提交 3000字的文献阅读摘要；同时，
由选择同一文献的多位同学推举出一位代表，对文献内容进行一次公开宣讲，以达到互相学习的目的。文献阅读摘要要求回答如下问题：
1,文献内容概述 —— 包括主要的实验方法与结果、
重要的实验进展
2,文献所获得的结果与现有薄膜材料制备技术理论的相关性
3．今后可以开展的实验工作课程实验
—— 薄膜材料专题文献阅读四、评分标准：
占考试总分数的 20%，其中：
技术和专业内容,60%
写作与形式表达,40%
课程实验
—— 薄膜材料专题文献阅读附：教师指定的英文文献 18篇
"W Nucleation on TiN from WF6 and SiH4" S,L,Lantz et al.,J,
Vac,Sci,Technol,A 12(4) 1032 (1994),
"Comparison of two epitaxial formation mechanisms in the SiGe
system and the subsequent defect generation" S,M,Prokes and
A,K,Rai,J,Vac,Sci,Technol,A 12(4) 1148 (1994),
"Dependence of material properties of RF magnetron-sputtered,
Cu-doped,ZnTe films on deposition conditions" T,A,Gessert et
al.,J,Vac,Sci,Technol,A 12(4) 1501 (1994),
"Study of ion-beam-sputtered ZnO films as a function of
deposition temperature" Y,Qu et al.,J,Vac,Sci,Technol,A
12(4) 1507 (1994),
"Microstructural study of sputter-deposited CdTe thin films" X,
Li et al.,J,Vac,Sci,Technol,A 12(4) 1608 (1994),
附：教师指定的英文文献 18篇
"Transition from Stranski-Krastanov to quasi-layer-by-layer
growth in Pb deposition on Cu(100)" H,Zeng et al.,J,Vac,Sci,
Technol,A 12(4) 2058 (1994),
"Heteroepitaxy of lattice-matched compound semiconductors on
silicon" K,Bachman et al,J,Vac,Sci,Technol,A 13(3) 696
(1995),
"Application of electron cyclotron resonance plasma source to
conductive film deposition" M,Shimada et al.,J,Vac,Sci,
Technol,A 13(3) 815 (1995),
"Fabrication of thin films with highly porous microstructures" K,
Robbie et al.,J,Vac,Sci,Technol,A 13(3) 1032 (1995),
"Low temperature formation of textured ZnO transparent
electrodes by magnetron sputtering" T,Minami et al.,J,Vac,
Sci,Technol,A 13(3) 1053 (1995),
附：教师指定的英文文献 18篇
"Effects of deposition conditions on the fluorine and hydrogen
concentration in tantalum pentoxide (Ta2O5) thin films prepared
by plasma enhanced chemical vapor deposition using a tantalum
pentafluoride (TaF5) source." E,Z,Luo et al.,J,Vac,Sci,
Technol,A 17(6),3235 (1999),
"Fine control of deposition film compositions using radio-
frequency reactive sputtering with periodic gas additions" S,
Kimura et al.,J,Vac,Sci,Technol,A 17(6),3312 (1999),
"Mechanism of columnar microstructure growth in titanium
oxide thin films deposited by ion-beam assisted deposition" Q,
Tang et al.,J,Vac,Sci,Technol,A 17(6),3379 (1999),
"Preparation and mechanical properties of composite diamond-
like thin films" Q,Wei et al.,J,Vac,Sci,Technol,A 17(6),3406
(1999),
附：教师指定的英文文献 18篇
"Vapor-deposited gold film formation on highly oriented
pyrolitic graphite,A transition from pseudo-two-dimensional
branched island growth to continuous film formation" B,Blum
et al.,J,Vac,Sci,Technol,B 17(6),2431 (1999),
"Multisource plasma chemical vapor depostion for synthesis of
SiNx-SiOy and SiNx-SiCy composite films" R,Nonogaki et al.,
J,Vac,Sci,Technol,A 18(1),63 (2000),
"Chemical vapor deposition of pyrolitic boron nitride from
borazine" V,Demin et al.,J,Vac,Sci,Technol,A 18(1),94
(2000),
"Growth and modification of Ag islands on hydrogen terminated
Si(100) surfaces" M,J,Butcher et al.,J,Vac,Sci,Technol,B
18(1),13 (2000)
Thin Film Materials & Nanotechnology
北京科技大学材料科学学院 唐伟忠
Tel,6233 2475
E-mail,wztang@mater.ustb.edu.cn
课件下载网址,wztang_teaching@sina.com
下 载 密 码,123456
课程实验
—— 薄膜材料专题文献阅读一、实验目的每位同学以自己选择的英文文献为线索
，通过阅读文献和其他的相关材料，达到较深入地了解薄膜材料制备技术领域某一具体课题的目的。
二、实验内容与方案根据指导教师给定的英文文献，结合授课内容进行独立阅读，并查阅相关的背景资料，并完成 3000字左右的文献阅读报告。同时，通过对于文献的公开宣讲，使其他同学也对相关课题有所了解。
三、实验基本要求每位同学阅读自己选择的文献，并按照文献的实验思路提交 3000字的文献阅读摘要；同时，
由选择同一文献的多位同学推举出一位代表，对文献内容进行一次公开宣讲，以达到互相学习的目的。文献阅读摘要要求回答如下问题：
1,文献内容概述 —— 包括主要的实验方法与结果、
重要的实验进展
2,文献所获得的结果与现有薄膜材料制备技术理论的相关性
3．今后可以开展的实验工作课程实验
—— 薄膜材料专题文献阅读四、评分标准：
占考试总分数的 20%，其中：
技术和专业内容,60%
写作与形式表达,40%
课程实验
—— 薄膜材料专题文献阅读附：教师指定的英文文献 18篇
"W Nucleation on TiN from WF6 and SiH4" S,L,Lantz et al.,J,
Vac,Sci,Technol,A 12(4) 1032 (1994),
"Comparison of two epitaxial formation mechanisms in the SiGe
system and the subsequent defect generation" S,M,Prokes and
A,K,Rai,J,Vac,Sci,Technol,A 12(4) 1148 (1994),
"Dependence of material properties of RF magnetron-sputtered,
Cu-doped,ZnTe films on deposition conditions" T,A,Gessert et
al.,J,Vac,Sci,Technol,A 12(4) 1501 (1994),
"Study of ion-beam-sputtered ZnO films as a function of
deposition temperature" Y,Qu et al.,J,Vac,Sci,Technol,A
12(4) 1507 (1994),
"Microstructural study of sputter-deposited CdTe thin films" X,
Li et al.,J,Vac,Sci,Technol,A 12(4) 1608 (1994),
附：教师指定的英文文献 18篇
"Transition from Stranski-Krastanov to quasi-layer-by-layer
growth in Pb deposition on Cu(100)" H,Zeng et al.,J,Vac,Sci,
Technol,A 12(4) 2058 (1994),
"Heteroepitaxy of lattice-matched compound semiconductors on
silicon" K,Bachman et al,J,Vac,Sci,Technol,A 13(3) 696
(1995),
"Application of electron cyclotron resonance plasma source to
conductive film deposition" M,Shimada et al.,J,Vac,Sci,
Technol,A 13(3) 815 (1995),
"Fabrication of thin films with highly porous microstructures" K,
Robbie et al.,J,Vac,Sci,Technol,A 13(3) 1032 (1995),
"Low temperature formation of textured ZnO transparent
electrodes by magnetron sputtering" T,Minami et al.,J,Vac,
Sci,Technol,A 13(3) 1053 (1995),
附：教师指定的英文文献 18篇
"Effects of deposition conditions on the fluorine and hydrogen
concentration in tantalum pentoxide (Ta2O5) thin films prepared
by plasma enhanced chemical vapor deposition using a tantalum
pentafluoride (TaF5) source." E,Z,Luo et al.,J,Vac,Sci,
Technol,A 17(6),3235 (1999),
"Fine control of deposition film compositions using radio-
frequency reactive sputtering with periodic gas additions" S,
Kimura et al.,J,Vac,Sci,Technol,A 17(6),3312 (1999),
"Mechanism of columnar microstructure growth in titanium
oxide thin films deposited by ion-beam assisted deposition" Q,
Tang et al.,J,Vac,Sci,Technol,A 17(6),3379 (1999),
"Preparation and mechanical properties of composite diamond-
like thin films" Q,Wei et al.,J,Vac,Sci,Technol,A 17(6),3406
(1999),
附：教师指定的英文文献 18篇
"Vapor-deposited gold film formation on highly oriented
pyrolitic graphite,A transition from pseudo-two-dimensional
branched island growth to continuous film formation" B,Blum
et al.,J,Vac,Sci,Technol,B 17(6),2431 (1999),
"Multisource plasma chemical vapor depostion for synthesis of
SiNx-SiOy and SiNx-SiCy composite films" R,Nonogaki et al.,
J,Vac,Sci,Technol,A 18(1),63 (2000),
"Chemical vapor deposition of pyrolitic boron nitride from
borazine" V,Demin et al.,J,Vac,Sci,Technol,A 18(1),94
(2000),
"Growth and modification of Ag islands on hydrogen terminated
Si(100) surfaces" M,J,Butcher et al.,J,Vac,Sci,Technol,B
18(1),13 (2000)
